16/08997 - Fully UHV compatible sputter deposition chamber

DTU Physics is already running a sputter deposition system which has been very productive for the research at the department. However, due to the wish to be able to handle highly oxygen sensitive materials, it has become a problem to use the same setup to deposit pure metal samples as well as oxides. These new metals will react very rapidly with both oxygen and water during deposition and the result is a bulk oxide and not the wanted pure metal phase. Therefore we need a new, smaller but similar system, which can be kept extremely clean and thus allow work on samples which has an ex-tremely reactivity with oxygen.

12-09-2016 12:00:00

38000000-5  Laboratory, optical and precision equipments (excl. glasses)