Documents - Package 516545:1 - Silicon deep reactive ion etcher (Si DRIE)
Document available to downloadSize (kB)
Other documents (Available after expression of interest)
 Agreement - DRAFT.docx
 Appendix 1 - Requirement specification.xlsx
 Appendix 2 - Prices.dotm
 Appendix 3 - Si DRIE - Process and wafer description.pdf
 Appendix 4 - Solemn Declaration regarding Russia.dotx
 Appendix A - Consortium Declaration.dotm
 Appendix B - Letter of support.dotm
 INSTRUCTIONS TO TENDERERS - Si DRIE Etcher - Open Procedure.pdf
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