Documents - Package 542407:1 - Delivery and installation of a ICP Reactive ion etcher for silicon dielctrics
Document available to downloadSize (kB)
Other documents (Available after expression of interest)
 Agreement_DRAFT.docx
 Appendix 1 - Requirement specification dielectric etcher.xlsx
 Appendix 2 - Prices (template).docx
 Appendix 3 - Grating etch with resist mask.pdf
 Appendix 4 - Solemn declaration regarding Russia.docx
 Appendix A - Consortium declaration.docx
 Appendix B - Letter of support.docx
 INSTRUCTIONS TO TENDERERS 08102026.pdf
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